About
Overview
Quantum-Nano FAB Center
| Affiliation | Category | Personnel | Location | Cleanroom | |||
|---|---|---|---|---|---|---|---|
| UNIST Office of Research Facilities and Training Fabrication and Manufacturing Support Team |
Quantum-Nano FAB | Director (Team Leader): 1 Director (Team Leader): 1 |
UNIST Building 108, B1 |
Area | Cleanliness | Temperature | Humidity |
| 1,300 ㎡ (Sub FAB 1,300 ㎡) |
1000 class /
100 class |
22 ℃ | 55 % | ||||
Wet station
Acid I Solvent I Alkali
Thinfilm & Etch
P-CVD I ALD I
CCP etcher
Diffusion
Wet & Dry furnace
Packaging
Dicing saw I CMP
Photo
Photo lithography
Spin coater & Bake
Thinfilm
PVD I Sputter I
E-beam evaporator
Thinfilm & Etch
Sputter I ICP-RIE
Etch
RIE I Deep etcher
Photo
Photo lithography
Sub-Fab
Utility I Vacuum pump
Exhaust system Scrubber
User-Centric Open Fab Operation
Select / Apply for Relevant Training
- Experience: Minimum 5 years ~ Maximum 28 years
- Master’s / Ph.D. degree or higher: Over 50%
- Research equipment technical support, training, and facility management
Proven Self-User System
- Over 19,000 cases of direct usage annually
- Self-service equipment usage rate based on operation hours: 80.8% (2025)
- Available for direct usage 24 hours a day
Enhanced Safety Management
- Conduct safety training twice a month
- Operate safety monitoring and access control systems
- For after-hours usage, a minimum 2-person team entry and prior approval are mandatory
Advanced Infrastructure
- Research equipment status (As of 2025): Around 60 types, worth 20 billion KRW
- Selected for the 2024 Open Quantum Process Infrastructure Construction Project: Constructing a shared-use research equipment infrastructure worth 20 billion KRW (~2031)
Systematic Training Program
- Regular training once a week per equipment (389 sessions, 2025)
- On-demand training provided as needed
- Conducted a total of 1,435 sessions / 2025 (An increase of 283 sessions compared to the previous year)
External User Support
- Support for long-distance external researchers’ stays (Guest House)
- Provide office spaces and waiting areas
- Equipment reservation system and equipment usage training
- Direct equipment usage available upon acquiring qualifications
Facilities & Equipment / Support System
Control Room
Tour Course
Tour Course
Smock Room
Corridor
Wet Room
Yellow Room #1
Yellow Room #2
Yellow Room #3
White Room #1
White Room #2
White Room #3
White Room #4
White Room #5
Sub Fab
Photolithography Process
MEMS / NEMS pattern formation and pre-lift-off processes
MEMS / NEMS pattern formation and pre-lift-off processes
Thin Film Deposition & Etching Process
Deposition of non-metallic insulating thin films (oxide, nitride, dielectric films, etc.) and formation of dry-etched structures
Deposition of non-metallic insulating thin films (oxide, nitride, dielectric films, etc.) and formation of dry-etched structures
Device Characterization
Contact / non-contact, electrical characterization, and image measurement & analysis using custom-fabricated specimens
Contact / non-contact, electrical characterization, and image measurement & analysis using custom-fabricated specimens
Wet Cleaning Process
Specimen surface cleaning using chemicals and wet etching
Specimen surface cleaning using chemicals and wet etching
